JPH0588502B2 - - Google Patents

Info

Publication number
JPH0588502B2
JPH0588502B2 JP58226858A JP22685883A JPH0588502B2 JP H0588502 B2 JPH0588502 B2 JP H0588502B2 JP 58226858 A JP58226858 A JP 58226858A JP 22685883 A JP22685883 A JP 22685883A JP H0588502 B2 JPH0588502 B2 JP H0588502B2
Authority
JP
Japan
Prior art keywords
channel plate
sample
ion
ion beam
microbeam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58226858A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60121654A (ja
Inventor
Susumu Ishitani
Yoshimi Kawanami
Kaoru Umemura
Hifumi Tamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58226858A priority Critical patent/JPS60121654A/ja
Publication of JPS60121654A publication Critical patent/JPS60121654A/ja
Publication of JPH0588502B2 publication Critical patent/JPH0588502B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
JP58226858A 1983-12-02 1983-12-02 イオンビーム装置 Granted JPS60121654A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58226858A JPS60121654A (ja) 1983-12-02 1983-12-02 イオンビーム装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58226858A JPS60121654A (ja) 1983-12-02 1983-12-02 イオンビーム装置

Publications (2)

Publication Number Publication Date
JPS60121654A JPS60121654A (ja) 1985-06-29
JPH0588502B2 true JPH0588502B2 (en]) 1993-12-22

Family

ID=16851670

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58226858A Granted JPS60121654A (ja) 1983-12-02 1983-12-02 イオンビーム装置

Country Status (1)

Country Link
JP (1) JPS60121654A (en])

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63102151A (ja) * 1986-10-17 1988-05-07 Rikagaku Kenkyusho 飛行時間測定型の同軸型材料表面解析装置
JP2726442B2 (ja) * 1988-08-31 1998-03-11 日本電子株式会社 荷電粒子検出器用電源装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5221909B2 (en]) * 1972-03-17 1977-06-14
JPS5718137B2 (en]) * 1973-12-24 1982-04-15
JPS56126933A (en) * 1980-03-11 1981-10-05 Nippon Telegr & Teleph Corp <Ntt> Contactless evaluator for semiconductor

Also Published As

Publication number Publication date
JPS60121654A (ja) 1985-06-29

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